Z Stage
Our Z-Stages provide a very compact, accurate means of achieving vertical motion.
- Micro-Z: Ultra compact stage featuring a high performance 1.8 degree stepping motor with an integrated rotating nut.
- Z-Elevator: Precision, non-recirculating ways in each of the four corners keep pitch and yaw below 15 arc-seconds over full travel.
- Z-Theta: Adds a small angle theta-axis to our 0.5 inch travel Z-Elevator stage. It is designed to accommodate varying sample thicknesses and rovide theta alignment.
- BAZ Ultrastiff: Provides very stiff vertical motion with low angular errors and high resolution.
Z Theta
The Z-Theta Stage adds a small angle theta-axis to our 0.5 inch travel Z-Elevator stage. This second axis adds only 15mm to the overall height, making the total collapsed eight of this two-axis assembly only 3.465". It is designed to accommodate varying sample thicknesses and provide theta alignment. The theta axis uses a leadscrew with a highrepeatability friction nut as its drive mechanism while a decoupling device allows precise angular motion. Both axes incorporate 23 frame motors and Hall-effect limits with lock-ing connectors.Learn More >
Z Elevator
The Danaher Motion Z-Elevator Stages provide a very compact, accurate means of achieving vertical motion. Precision, non-recircu-lating ways in each of the four corners keep pitch and yaw below 15 arc-seconds over full travel. This way configuration provides very straight, smooth, and repeatable motion which is needed to satisfy demanding wafer inspection, scanning, and probing applications.Learn More >
Micro-Z
Danaher Motion’s Micro-Z stage is an ultra compact stage featuring a high performance 1.8 degree stepping motor with an integrated rotating nut. With travels up to 3 inches and numerous leadscrew options the Micro-Z fits many applications needs.Learn More >
BAZ UltraStiff
The BAZ, Ultra-Stiff Z-Elevator Stage provides very stiff vertical motion with low angular errors and high resolution. Its unique design maintains a torsional stiffness of 4 x 10 5 N-m/rad and a lateral stiffness of 1 x 10 7 N/m, making it ideal for wafer positioning applications. Precision, crossed roller ways support user loads up to 50 kg and keep angular runouts to 5 arc-seconds or less over the full 5mm travel.Learn More >
